Ibss T12 High Vacuum 8 -inch wafer chamber plasma cleaner

Overview

The ibss T12 is high vacuum plasma processing station that can handle a full 8-inch wafer.

The ibss T12 features:

• High Vacuum Turbo Pumped Oil Free vacuum system.
• Simple user interface: 3 position toggle switch - On/Off/Vent initiate cleaning.
• ibss GUI/software in Tablet provides settable menus, time and power and monitoring and setting of plasma parameters.
• Choice of plasma gas mixtures available on request
• Mobile and mobile: Locking caster on S/S cart offers effortless movement when shifting the plasma cleaning center from lab to lab.
• Locking drawer Locks for Tablet Security

Specifications

• S2/S8 Compliant
• Up to 99 Watts at 13.56 MHz
• Down to <1E-6 Torr base pressure
• Shutoff leakage - 1E-8 Torr l/s, 1.3E-9 Pa-m3/s
• Opto-isolated COM port for Windows OS
• Up to 9 TEM Holders , upon request
• 3-Position toggle (Pump-Off-Vent)
• 4" Touchscreen Control Panel
• Qwk-SwitchTM Source mounting to transfer to SEM
• 100-230 VAC, 50/60 Hz, Power consumption 500VA at 50 Ohms
• HxWxD 36 x 102 x 51 cm / 40” x 20” x 14”
• Viewport Al chamber 12" x 12"
• Weight ~150lbs / 55 kg

Ibss T12 High Vacuum 8 -inch wafer chamber plasma cleaner

 

Product # Unit Name

Ibss T12 High Vacuum 8 -inch wafer chamber plasma cleaner

Request Quote / Info