Ibss GV10X P6-UHV In Situ Plasma Cleaner

Overview

Ultra high vacuum UHV is critical in many surface analysis techniques, where minimizing contamnation is critical to allow precise measurements. In most cases materials are brought to a "Pre-Chamber" prior to being inserted in the UHV chamber. The GV10x UHV DS Asher is designed to reside on a UHV pre chamber after chamber plasma cleaning in millitorr range without breaking vacuum. This one of a kind in-situ plasma source eliminates the need for a costly isolation valve and pre-pump.

Key Features:

• Cleaning Cycle in Minutes; 10X Faster than Competitive Units
• Offers Superior Performance over ‘Classical’ Capacitive Antenna Source
• O2/Ar O0 Plasma for Non-Oxidizing Surfaces
• H2/Ar/Ne H0 Plasma for Ni and Rh oxidizing layers
• Grating Efficiency Increased by factor of 7.6
• Full Recovery of Blazed High Energy Grating Profile
• Continuously Adjustable

Ibss GV10X P6-UHV In Situ Plasma Cleaner

 

Product # Unit Name

Ibss GV10X P6-UHV In Situ Plasma Cleaner

The GV10x UHV DS Asher is designed to reside on a UHV chamber after chamber plasma cleaning in millitorr range without breaking vacuum. This one of a kind in-situ plasma source eliminates the need for a costly isolation valve and pre-pump.

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